Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Top Precursor Searches - July 2021

Number Precursor CAS# Searches
1BDEASi, SAM-24, Bis(diethylamido)silane, (Et2N)2SiH227804-64-499
2Tris(dimethylamino)cyclopentadienyl Zirconium, CpZr(NMe2)333271-88-424
2Pentamethyl cyclopentadienyl titanium trimethoxide, Ti(CpMe5)(OMe)3123927-75-324
2TBTDENb, Tris(diethylamido)(tert-butylimido)niobium, t-BuN=Nb(Et2N)3210363-27-224
5TEMAHf, Tetrakis(EthylMethylAmido) Hafnium, (EtMeN)4Hf352535-01-416