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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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On/Off Current Ratio Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing On/Off Current Ratio returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
2Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
3Fast Flexible Plastic Substrate ZnO Circuits
4Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
5The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor