Publication Information

Title: Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide

Type: Journal

Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012

Date: 2011-11-20

DOI: http://dx.doi.org/10.1116/1.3670876

Author Information

Name

Institution

Infineon Technologies AG

Infineon Technologies AG

R3T GmbH

Films

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

546-68-9

7732-18-5

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

546-68-9

10028-15-6

Plasma TiO2 using ASM A400

Deposition Temperature Range = 150-240C

546-68-9

7782-44-7

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-39-6

7732-18-5

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-39-6

10028-15-6

Plasma TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-39-6

7782-44-7

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3275-24-9

7732-18-5

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3275-24-9

10028-15-6

Plasma TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3275-24-9

7782-44-7

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-36-3

7732-18-5

Thermal TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-36-3

10028-15-6

Plasma TiO2 using ASM A400

Deposition Temperature Range = 150-240C

3087-36-3

7782-44-7

Thermal Al2O3 using ASM A400

Deposition Temperature Range = 150-240C

75-24-1

7732-18-5

Plasma AlTixOy using ASM A400

Deposition Temperature Range = 150-240C

3275-24-9

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Anneal

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Unknown

Substrates

Silicon

TaN

TiN

W

Keywords

High-k Dielectric Thin Films

Notes

196

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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