TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
2Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
3DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
4Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
5Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
7EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide
8Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
10Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
2Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
3Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
4Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
5Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
6Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
7Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
8Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
9Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
10Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
11Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
12Biofilm prevention on cochlear implants
13Lithium-Iron (III) Fluoride Battery with Double Surface Protection
14Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
15Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
16Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
17Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
18Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
19Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
20Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
21In-gap states in titanium dioxide and oxynitride atomic layer deposited films
22Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
23Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
24The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
25Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
26Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
27Room temperature atomic layer deposition of TiO2 on gold nanoparticles
28Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
29Atomic layer deposition of titanium nitride for quantum circuits
30Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
31Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
32Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
33Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
34Sub-10-nm ferroelectric Gd-doped HfO2 layers
35Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
36Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
37Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
38Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
39Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
40Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
41ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
42Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
43Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
44Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
45Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
46Atomic layer deposition of titanium nitride from TDMAT precursor
47Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
48Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
49Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
50Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
51Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
52Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
53Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
54Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
55Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
56Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
57Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
58Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
59Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
60Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
61Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
62Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
63Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
64Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
65Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
66Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
67Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
68Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
69Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
70Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
71Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
72Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
73Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
74Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
75Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
76Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
77Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
78Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
79The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
80On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
81ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
82Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
83Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
84The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
85Fully CMOS-compatible titanium nitride nanoantennas
86Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
87Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
88Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
89Annealing behavior of ferroelectric Si-doped HfO2 thin films
90Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
91Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
92Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
93Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
94Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
95X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
96Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
97Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
98Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
99In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
100High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
101Analysis of nitrogen species in titanium oxynitride ALD films
102Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
103Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
104Transient characterization of the electroforming process in TiO2 based resistive switching devices
105Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
106Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
107A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
108Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
109Plasma-enhanced atomic layer deposition of titanium vanadium nitride
110Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
111Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
112Texture of atomic layer deposited ruthenium
113Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
114Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
115Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
116Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
117Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
118ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
119Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
120Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
121Impact of interface materials on side permeation in indirect encapsulation of organic electronics
122Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
123The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
124Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
125Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
126Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
127Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
128Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
129Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
130Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
131Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
132Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
133Plasma-enhanced atomic layer deposition of titanium vanadium nitride
134Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
135Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
136Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
137Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
138Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
139Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
140Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
141Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
142Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique