TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me2N]4Ti, CAS# 3275-24-9

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT
2Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
4EpiValenceTitanium dimethylamide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 69 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1AlTixOyAl2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2AlTixOyLow-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3AlTixOyPlasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4AlTixOyRutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5RuTiNImproved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
6RuTiNPlasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
7TiAlNElectrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
8TiAlNTi-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
9TiCNPlasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
10TiCNTunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
11TiNALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
12TiNALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
13TiNAnnealing behavior of ferroelectric Si-doped HfO2 thin films
14TiNApproximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
15TiNAtomic layer deposition of titanium nitride from TDMAT precursor
16TiNCharacteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
17TiNCharacteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
18TiNComparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
19TiNControllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
20TiNFully CMOS-compatible titanium nitride nanoantennas
21TiNHigh aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
22TiNHighly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
23TiNLow sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
24TiNLow-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
25TiNLow-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
26TiNPlasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
27TiNPotassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
28TiNReliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
29TiNRemote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
30TiNStuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
31TiNSub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
32TiNThermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
33TiNTi-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
34TiNTunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
35TiO2A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
36TiO2Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
37TiO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
38TiO2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
39TiO2Biofilm prevention on cochlear implants
40TiO2Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
41TiO2Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
42TiO2Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
43TiO2Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
44TiO2Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
45TiO2Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
46TiO2Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
47TiO2Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
48TiO2Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
49TiO2Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
50TiO2Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
51TiO2Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
52TiO2Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
53TiO2Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
54TiO2Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
55TiO2Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
56TiO2Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
57TiO2Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
58TiO2Room temperature atomic layer deposition of TiO2 on gold nanoparticles
59TiO2Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
60TiO2Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
61TiO2The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
62TiO2The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
63TiO2Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
64TiO2Transient characterization of the electroforming process in TiO2 based resistive switching devices
65TiO2Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
66TiO2X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
67TiONAnalysis of nitrogen species in titanium oxynitride ALD films
68TiONAnalysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
69TiONPlasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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