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Wet Etch Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Wet Etch Resistance returned 33 record(s).

NumberTitle
1Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
2Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
3High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
4Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
5Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
6Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
7Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
8Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
9Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
10Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
11Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
12Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
13Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
14The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
15Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
16Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
17Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
18Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
19Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
20Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
21Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
22Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
23Challenges in spacer process development for leading-edge high-k metal gate technology
24Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
25Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
26Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
27Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
28Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
29Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
30Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
31Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
32Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
33Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies