Publication Information

Title: High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma

Type: Journal

Info: Thin Solid Films 583 (2015) 40-45

Date: 2015-03-23

DOI: http://dx.doi.org/10.1016/j.tsf.2015.03.054

Author Information

Name

Institution

Chung-Ang University

Chung-Ang University

Films

Plasma IGZO using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

SiO2

Keywords

Notes

481



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