Publication Information

Title:
High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma
Type:
Journal
Info:
Thin Solid Films 583 (2015) 40-45
Date:
2015-03-23

Author Information

Name Institution
Young-Hee JooChung-Ang University
Chang-Il KimChung-Ang University

Films

Plasma IGZO

Hardware used: Unknown


Film/Plasma Properties

Substrates

SiO2

Keywords

Notes

481