High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma

Type:
Journal
Info:
Thin Solid Films 583 (2015) 40-45
Date:
2015-03-23
DOI:
http://dx.doi.org/10.1016/j.tsf.2015.03.054

Author Information

Name Institution
Young-Hee JooChung-Ang University
Chang-Il KimChung-Ang University

Films

Plasma IGZO

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

SiO2

Notes

481