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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
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Publication Information
Title:
Reliability and failure physics of GaN HEMT, MIS-HEMT and p-gate HEMTs for power switching applications: Parasitic effects and degradation due to deep level effects and time-dependent breakdown phenomena
Type:
Journal
Info:
2015 IEEE 3rd Workshop on Wide Bandgap Power Devices and Applications (WiPDA)
Date:
2015-11-02
Author Information
| Name | Institution |
|---|---|
| Enrico Zanoni | University of Padova |
| Matteo Meneghini | University of Padova |
| Gaudenzio Meneghesso | University of Padova |
| Davide Bisi | University of Padova |
| Isabella Rossetto | University of Padova |
| Antonio Stocco | University of Padova |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 479 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |