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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Gaudenzio Meneghesso Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Gaudenzio Meneghesso returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Trapping and reliability issues in GaN-based MIS HEMTs with partially recessed gate
2Impact of gate insulator on the dc and dynamic performance of AlGaN/GaN MIS-HEMTs
3Reliability and failure physics of GaN HEMT, MIS-HEMT and p-gate HEMTs for power switching applications: Parasitic effects and degradation due to deep level effects and time-dependent breakdown phenomena
4Reliability and parasitic issues in GaN-based power HEMTs: a review