Publication Information

Title: Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells

Type: Conference Proceedings

Info: Proceedings of the 25th European Photovoltaic Solar Energy Conference

Date: 2010-09-06

DOI: http://www.isfh.de/institut_solarforschung/files/25eupvsec_schmidt.pdf

Author Information

Name

Institution

Institute for Solar Energy Research Hamelin (ISFH)

Institute for Solar Energy Research Hamelin (ISFH)

Institute for Solar Energy Research Hamelin (ISFH)

Institute for Solar Energy Research Hamelin (ISFH)

Institute for Solar Energy Research Hamelin (ISFH)

SoLayTec

TNO

TNO

The Australian National University

The Australian National University

Institute for Solar Energy Research Hamelin (ISFH)

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Thermal Al2O3 using Unknown

Deposition Temperature Range N/A

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Lifetime

Photoconductance

Sinton WCT-100

Surface Recombination Velocity

Photoconductance

Sinton WCT-100

Open Circuit Voltage

Unknown

Unknown

Short Circuit Current

Unknown

Unknown

Fill Factor

Unknown

Unknown

Efficiency

Unknown

Unknown

Substrates

Silicon

Keywords

Solar

Passivation

Plasma vs Thermal Comparison

Notes

Compares plasma film with conventional thermal and spatial thermal ALD.

708

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