Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 97 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
11D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
5Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
6Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
7Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
8Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
9Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
10Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
12Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
13Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
14Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
15Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
16Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
17Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
18Comparative study of ALD SiO2 thin films for optical applications
19Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
20Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
21Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
22Densification of Thin Aluminum Oxide Films by Thermal Treatments
23Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
24Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
25Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
26Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
27Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
28Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
29Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
30Energy-enhanced atomic layer deposition for more process and precursor versatility
31Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
32Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
33Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
34Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
35Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
36Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
37High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
38High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
39Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
40Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
41Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
42Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
43In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
44Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
45Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
46Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
47Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
48Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
49Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
50Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
51Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
52Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
53Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
54Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
55Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
56Microwave properties of superconducting atomic-layer deposited TiN films
57NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
58Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
59On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
60Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
61Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
62Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
63PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
64Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
65Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
66Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
67Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
68Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
69Plasma-enhanced atomic layer deposition of BaTiO3
70Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
71Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
72Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
73Propagation Effects in Carbon Nanoelectronics
74Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
75Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
76Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
77Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
78Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
79Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
80Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
81Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
82Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
83Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
84Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
85Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
86Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
87Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
88Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
89The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
90The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
91The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
92Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
93Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
94Top-down fabricated ZnO nanowire transistors for application in biosensors
95Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
96Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
97Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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