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Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
Type:
Journal
Info:
Nanotechnology 29 (jul) 405302
Date:
2018-07-26
Author Information
| Name | Institution |
|---|---|
| Stefano Dallorto | Lawrence Berkeley National Laboratory |
| Daniel Staaks | Lawrence Berkeley National Laboratory |
| Adam M. Schwartzberg | Lawrence Berkeley National Laboratory |
| XiaoMin Yang | Seagate Technology |
| Kim Y Lee | Seagate Technology |
| Ivo W Rangelow | Ilmenau University of Technology |
| Stefano Cabrini | Lawrence Berkeley National Laboratory |
| Deirdre L. Olynick | Lawrence Berkeley National Laboratory |
Films
Thermal TiO2
Plasma TiO2
Thermal SiO2
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Nucleation
Analysis: Ellipsometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| SiO2 |
| Cr |
| Carbon |
Notes
| 1578 |