Publication Information

Title: Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications

Type: Journal

Info: J. Vac. Sci. Technol. B 32(3), May/Jun 2014

Date: 2013-07-15

DOI: http://dx.doi.org/10.1116/1.4818254

Author Information

Name

Institution

U.S. Naval Research Laboratory

Films

Deposition Temperature = 250C

75-24-1

7782-44-7

Deposition Temperature = 250C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

195

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