Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Dai-Hong Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dai-Hong Kim returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
2Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
3Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD