Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Chuanzhen Zhou Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chuanzhen Zhou returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The effects of layering in ferroelectric Si-doped HfO2 thin films
2TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
3Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films