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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
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Dong-Jin Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dong-Jin Park returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
2Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
3The physical properties of cubic plasma-enhanced atomic layer deposition TaN films