tris(3-hexyne)tungsten(0) carbonyl, CAS# 12131-66-7

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1Ereztechtris(3-hexyne)tungsten(0) carbonyl

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
3A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier