tris(3-hexyne)tungsten(0) carbonyl, CAS# 12131-66-7

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸tris(3-hexyne)tungsten(0) carbonyl

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
4A controlled growth of WNx and WCx thin films prepared by atomic layer deposition