Precursor Characterization Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Precursor Characterization returned 23 record(s).

Number	Title
1	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
2	Atomic layer deposition of high purity Ga₂O₃ films using liquid pentamethylcyclopentadienyl gallium and combinations of H₂O and O₂ plasma
3	Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
4	An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor
5	Low-temperature direct synthesis of high quality WS₂ thin films by plasma-enhanced atomic layer deposition for energy related applications
6	Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
7	Copper-ALD Seed Layer as an Enabler for Device Scaling
8	Atomic layer deposition of stoichiometric In₂O₃ films using liquid ethylcyclopentadienyl indium and combinations of H₂O and O₂ plasma
9	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
10	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
11	Epitaxial GaN using Ga(NMe₂)₃ and NH₃ plasma by atomic layer deposition
12	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
13	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
14	PEALD of HfO₂ Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
15	Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
16	Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
17	Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
18	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
19	From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
20	Atomic Layer Deposition of Gold Metal
21	Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
22	PEALD of Copper using New Precursors for Next Generation of Interconnections
23	Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design

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Precursor Characterization Plasma Enhanced Atomic Layer Deposition Publications