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The publication database currently has 1567 entries.

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195 Films Compositions

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242 Film and Plasma Characteristics

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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

Search 1567 plasma ALD publications by:

195 Films Compositions

265 Precursors and Plasma Gases

76 Deposition Hardwares

242 Film and Plasma Characteristics

Characterization of SiN_x/AlN passivation stack with epitaxial AlN grown on AlGaN/GaN heterojunctions by plasma-enhanced atomic layer deposition

Type:

Journal

Info:

2015 Appl. Phys. Express 8 064101

Date:

2015-04-19

DOI:

http://dx.doi.org/10.7567/APEX.8.064101

Author Information

Name	Institution
Yunyou Lu	Hong Kong University of Science and Technology
Qimeng Jiang	Hong Kong University of Science and Technology
Zhikai Tang	Hong Kong University of Science and Technology
Shu Yang	Hong Kong University of Science and Technology
Cheng Liu	Hong Kong University of Science and Technology
Kevin J. Chen	Hong Kong University of Science and Technology

Films

Plasma AlN

Hardware used: Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Keywords

Notes

437