Publication Information

Title:
Characterization of SiNx/AlN passivation stack with epitaxial AlN grown on AlGaN/GaN heterojunctions by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
2015 Appl. Phys. Express 8 064101
Date:
2015-04-19

Author Information

Name Institution
Yunyou LuHong Kong University of Science and Technology
Qimeng JiangHong Kong University of Science and Technology
Zhikai TangHong Kong University of Science and Technology
Shu YangHong Kong University of Science and Technology
Cheng LiuHong Kong University of Science and Technology
Kevin J. ChenHong Kong University of Science and Technology

Films

Plasma AlN

Hardware used: Unknown


Film/Plasma Properties

Substrates

Keywords

Notes

437