Characterization of SiNx/AlN passivation stack with epitaxial AlN grown on AlGaN/GaN heterojunctions by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
2015 Appl. Phys. Express 8 064101
Date:
2015-04-19
Author Information
| Name | Institution |
|---|---|
| Yunyou Lu | Hong Kong University of Science and Technology |
| Qimeng Jiang | Hong Kong University of Science and Technology |
| Zhikai Tang | Hong Kong University of Science and Technology |
| Shu Yang | Hong Kong University of Science and Technology |
| Cheng Liu | Hong Kong University of Science and Technology |
| Kevin J. Chen | Hong Kong University of Science and Technology |
Films
Film/Plasma Properties
Substrates
Notes
| 437 |