Graphene photodetectors with a bandwidth >76 GHz fabricated in a 6" wafer process line

Type:
Journal
Info:
2017 J. Phys. D: Appl. Phys. 50 124004
Date:
2017-01-26
DOI:
http://dx.doi.org/10.1088/1361-6463/aa5c67

Author Information

Name Institution
Daniel SchallApplied Micro and Optoelectronic (AMO) GmbH
Caroline PorschatisApplied Micro and Optoelectronic (AMO) GmbH
Martin OttoApplied Micro and Optoelectronic (AMO) GmbH
Daniel NeumaierApplied Micro and Optoelectronic (AMO) GmbH

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

991