Publication Information

Title:
Detailed Atomistic Modeling of Si(110) Passivation by Atomic Layer Deposition of Al2O3
Type:
Other
Info:
Practical Aspects of Computational Chemistry IV, p. 303-351, 2016.
Date:
2016-05-18

Author Information

Name Institution
Andrey A. RybakovMoscow State University
Alexander V. LarinMoscow State University
Daniel P. VercauterenUniversity of Namur
Georgy M. ZhidomirovMoscow State University

Films

Plasma Al2O3

Hardware used: Unknown


Film/Plasma Properties

Substrates

Keywords

Notes

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