Publication Information

Title: Detailed Atomistic Modeling of Si(110) Passivation by Atomic Layer Deposition of Al₂O₃

Type: Other

Info: Practical Aspects of Computational Chemistry IV, p. 303-351, 2016.

Date: 2016-05-18

DOI: http://dx.doi.org/10.1007/978-1-4899-7699-4_11

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