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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Improvement on the Passivation Effect of Al2O3 Layer Deposited by PA-ALD in Crystalline Silicon Solar Cells
Type:
Journal
Info:
J . KIEEME, V ol. 26, No. 10, pp. 754-759, October 2013
Date:
2013-09-24
Author Information
| Name | Institution |
|---|---|
| Se Young Song | Chungnam National University |
| Min Gu Kang | Korea Institute of Energy Research |
| Hee-eun Song | Korea Institute of Energy Research |
| Hyo Sik Chang | Chungnam National University |
Films
Film/Plasma Properties
Characteristic: Interfacial Layer
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Blistering
Analysis: -
Characteristic: Lifetime
Analysis: -
Substrates
| Si(100) |
Keywords
Notes
| Written in Korean. |
| 569 |