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Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (7), pp 3913-3923
Date:
2021-01-11
Author Information
| Name | Institution |
|---|---|
| Martijn F. J. Vos | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
Films
Plasma AlF
Plasma AlF
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
| Al2O3 |
Notes
| 1612 |