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Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 27, (2009)
Date:
2009-05-04
Author Information
| Name | Institution |
|---|---|
| G. Bruce Rayner, Jr. | University of Colorado, Boulder |
| Steven George | University of Colorado, Boulder |
Films
Plasma TaNx
Film/Plasma Properties
Characteristic: Nucleation
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Thickness
Analysis: AES, Auger Electron Spectroscopy
Substrates
| Al2O3 |
| Si(100) |
Notes
| 748 |