Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Andrew C. Kummel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Andrew C. Kummel returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
2Nitride passivation of the interface between high-k dielectrics and SiGe
3Experimental and theoretical determination of the role of ions in atomic layer annealing