Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Muhammad Adi Negara Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Muhammad Adi Negara returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
2Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices