Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Michael A. Mastro Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Michael A. Mastro returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
2Atomic layer epitaxy for quantum well nitride-based devices
3Perspectives on future directions in III-N semiconductor research
4Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy