Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Shihyun Ahn Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Shihyun Ahn returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
2High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors