HfTB, Hf[OC(Me)3]4, Hf[OC(CH3)3]4, Hafnium tetra-tert-butoxide, CAS# 2172-02-3

Where to buy

NumberVendorLink
1EreztechHafnium (IV) tert-butoxide (99.9%-Hf (excluding Zr))
2Strem Chemicals, Inc.Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
2Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
3Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition


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