|1||Strem Chemicals, Inc.||Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)|
|2||Ereztech||Hafnium (IV) tert-butoxide (99.9%-Hf (excluding Zr))|
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Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition|
|2||Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films|
|3||Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition|
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