Sr[Ta(OC2H5)5(OC2H4OCH3)]2, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
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|1||Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor|
|2||Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD|