ZrTB, Zr[OC(Me)3]4, Zr[OC(CH3)3]4, Zirconium tetra-tert-butoxide, CAS# 2081-12-1

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1EreztechZirconium(IV)tert-butoxide, (99.99%-Zr)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
2Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
3ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
4ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


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