DMAlH, Dimethylaluminumhydride, Me2AlH, (CH3)2AlH, CAS# 865-37-2

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NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Dimethylaluminumhydride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
2Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors