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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Remanent Polarization Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Remanent Polarization returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The effects of layering in ferroelectric Si-doped HfO2 thin films
2Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
3Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
4Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
5Sub-10-nm ferroelectric Gd-doped HfO2 layers