Your search for plasma enhanced atomic layer deposition publications discussing Trapped Positive Charge-Density Change returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer|
|2||Trapped charge densities in Al2O3-based silicon surface passivation layers|
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