Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Laser Induced Damage Threshold, LIDT Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Laser Induced Damage Threshold, LIDT returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
2Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition