Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Electronic Conduction Mechanisms in Insulators

Type:
Journal
Info:
IEEE Transactions on Electron Devices, Volume:65, Issue:1, 2018
Date:
2017-11-18
DOI:
http://dx.doi.org/10.1109/TED.2017.2776612

Author Information

Name Institution
Tsung-Han ChiangOregon State University
John F. WagerOregon State University

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Agilent 4155C Semiconductor Parameter Analyzer

Substrates

Silicon

Notes

1277