The publication database currently has 1511 entries.
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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
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Publication Information
Title:
Electronic Conduction Mechanisms in Insulators
Type:
Journal
Info:
IEEE Transactions on Electron Devices, Volume:65, Issue:1, 2018
Date:
2017-11-18
Author Information
| Name | Institution |
|---|---|
| Tsung-Han Chiang | Oregon State University |
| John F. Wager | Oregon State University |
Films
Film/Plasma Properties
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Substrates
| Silicon |
Keywords
Notes
| 1277 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |