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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
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Junction-less nanowire based photodetector: Role of nanowire width
Type:
Journal
Info:
Arxiv.org Preprint
Date:
2017-07-25
Author Information
| Name | Institution |
|---|---|
| Anita Fadavi Roudsari | University of Waterloo |
| Iman Khodadadzadeh | University of Waterloo |
| Simarjeet S Saini | University of Waterloo |
| MP Anantram | University of Washington |
| Nixon O | Teledyne DALSA Inc. |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
| Passivation |
Notes
| 1054 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |