Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Junction-less nanowire based photodetector: Role of nanowire width

Type:
Journal
Info:
Arxiv.org Preprint
Date:
2017-07-25
DOI:
https://arxiv.org/abs/1707.07892v1

Author Information

Name Institution
Anita Fadavi RoudsariUniversity of Waterloo
Iman KhodadadzadehUniversity of Waterloo
Simarjeet S SainiUniversity of Waterloo
MP AnantramUniversity of Washington
Nixon OTeledyne DALSA Inc.

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature = 300C

Film/Plasma Properties

Substrates

Silicon

Notes

1054