Plasma-Enhanced Atomic Layer Deposition Processed Amorphous Indium Zinc Oxide Thin-Film Transistor for Ultra-High Definition Display Application
Type:
Other
Info:
IMID 2015 Digest
Date:
2015-08-21
Author Information
| Name | Institution |
|---|---|
| Jong Beom Ko | Korea Advanced Institute of Science and Technology |
| Hye In Yeom | Korea Advanced Institute of Science and Technology |
| Chi Sun Hwang | Electronics and Telecommunication Research Institute, (ETRI) |
| Sung Haeng Cho | Electronics and Telecommunication Research Institute, (ETRI) |
| Sang-Hee Ko Park | Korea Advanced Institute of Science and Technology |
Films
Film/Plasma Properties
Substrates
Notes
| 394 |