Publication Information

Title:
Plasma-Enhanced Atomic Layer Deposition Processed Amorphous Indium Zinc Oxide Thin-Film Transistor for Ultra-High Definition Display Application
Type:
Other
Info:
IMID 2015 Digest
Date:
2015-08-21

Author Information

Name Institution
Jong Beom KoKorea Advanced Institute of Science and Technology
Hye In YeomKorea Advanced Institute of Science and Technology
Chi Sun HwangElectronics and Telecommunication Research Institute, (ETRI)
Sung Haeng ChoElectronics and Telecommunication Research Institute, (ETRI)
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Plasma InZnO

Hardware used: Unknown


Film/Plasma Properties

Substrates

Keywords

Notes

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