Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition Processed Amorphous Indium Zinc Oxide Thin-Film Transistor for Ultra-High Definition Display Application

Type: Other

Info: IMID 2015 Digest

Date: 2015-08-21

DOI: http://www.imid.or.kr/m/program_detail2.asp?pre_code

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Korea Advanced Institute of Science and Technology

Films

Plasma InZnO using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

394



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