Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Fabrication and Characterization of an Extended-Gate AlGaN/GaN-Based Heterostructure Field-Effect Transistor-Type Biosensor for Detecting Immobilized Streptavidin-Biotin Protein Complexes

Type:
Journal
Info:
Sensors and Materials, Vol. 27, No. 7 (2015) 575--583
Date:
2015-06-15
DOI:
http://dx.doi.org/10.18494/SAM.2015.1092

Author Information

Name Institution
Hee Ho LeeKyungpook National University
Myunghan BaeKyungpook National University
Sung-Hyun JoKyungpook National University
Jang-Kyoo ShinKyungpook National University
Dong Hyeok SonKyungpook National University
Chul-Ho WonKyungpook National University
Jung-Hee LeeKyungpook National University

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature = 450C

Film/Plasma Properties

Substrates

AlGaN

Notes

368