Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Anisotropic Inter-Poly Dielectric technology for conventional floating gate type flash memory

Type:
Conference Proceedings
Info:
2014 IEEE 6th International Memory Workshop (IMW)
Date:
2014-05-18
DOI:
http://dx.doi.org/10.1109/IMW.2014.6849362

Author Information

Name Institution
F. KikushimaToshiba Corporation

Films

Plasma SiNx

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

239