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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Anisotropic Inter-Poly Dielectric technology for conventional floating gate type flash memory
Type:
Conference Proceedings
Info:
2014 IEEE 6th International Memory Workshop (IMW)
Date:
2014-05-18
Author Information
| Name | Institution |
|---|---|
| F. Kikushima | Toshiba Corporation |
Films
Film/Plasma Properties
Substrates
Keywords
| Flash Memory |
Notes
| 239 |