Publication Information

Title: The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures

Type: Journal

Info: Facta universitatis - series: Electronics and Energetics 2014 Volume 27, Issue 4, Pages: 621-630

Date: 2014-07-21

DOI: http://dx.doi.org/10.2298/FUEE1404621P

Author Information

Name

Institution

Bulgarian Academy of Sciences

Films

Plasma HfO2 using Beneq TFS-200

Deposition Temperature = 300C

352535-01-4

7782-44-7

Thermal HfO2 using Beneq TFS-200

Deposition Temperature = 300C

352535-01-4

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

197

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com