Publication Information

Title: A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films

Type: Poster

Info: ALD 2010

Date: 2010-06-25

DOI: No DOI

Author Information

Name

Institution

University of Liverpool

University of Liverpool

University of Liverpool

Oxford Instruments

Oxford Instruments

Films

Deposition Temperature = 300C

352535-01-4

7664-41-7

Deposition Temperature = 300C

352535-01-4

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Compositional Depth Profiling

MEIS, Medium Energy Ion Scattering

Unknown

Density

MEIS, Medium Energy Ion Scattering

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Thermal Stability

Anneal

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Substrates

Keywords

PEALD Film Development

Notes

20

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