Publication Information

Title: Atomic layer controlled deposition of silicon nitride with self-limiting mechanism

Type: Journal

Info: Appl. Phys. Lett. 68, 3257 (1996)

Date: 1996-03-28

DOI: http://dx.doi.org/10.1063/1.116566

Author Information

Name

Institution

Hiroshima University

Hiroshima University

Hiroshima University

Films

Plasma SiNx using Unknown

Deposition Temperature Range N/A

4109-96-0

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Substrates

Unknown

Keywords

Plasma-Enhanced Atomic Layer Deposition

Notes

73

Disclaimer

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