Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||SiNx||Atomic layer controlled deposition of silicon nitride with self-limiting mechanism|
|2||SiNx||Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride|
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