Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Arouna Darga Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Arouna Darga returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Capacitance characterization of GaP/n-Si structures grown by PE-ALD
2Influence of PE-ALD of GaP on the Silicon Wafers Quality
3Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD