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Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
A. Talneau Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for plasma enhanced atomic layer deposition publications authored by A. Talneau returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon |