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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
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P. A. von Hauff Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by P. A. von Hauff returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
2High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
3Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN