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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
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Vincent Omarjee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Vincent Omarjee returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
2PEALD of Copper using New Precursors for Next Generation of Interconnections
3Copper-ALD Seed Layer as an Enabler for Device Scaling