Norihiko Ikeda Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Norihiko Ikeda returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
2Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
3Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy