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ASM Genitech PEALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Genitech PEALD hardware returned 20 records.

NumberTitle
1Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
2Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
3Flexible Memristive Memory Array on Plastic Substrates
4Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
5The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
6Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
7A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
8Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
9Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
10Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
11Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
12Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
13Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
14Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
15Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
16Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
17Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
18Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
19Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
20Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films