bis(tert-butylimido)bis(bis(trimethylsilylamido))tungsten(VI), [W(NtBu)2{N(SiMe3)2}2], CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
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| Number | Title |
|---|---|
| 1 | Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization |